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(Holloway) Chew, Kean Ho's Research and Libre License

A published research and experimentation friendly open-source license originally for (Holloway) Chew, Kean Ho but is now open to all product licensing purposes. This license was referenced from Open Source Initiative's BSD 3 Clauses License, Open Source Initiative's BSD 3 Clauses Clear License, Open Source Initiative's BSD 2 Clauses Patent License, Open Source Initiative's BSD 2 Clauses License, and Open Source Initiative's MIT License but was adopted and written from the Open Source Initiative's Apache 2.0 License and Creative Common Licenses as its baseline and applied the following changes:

  1. Changed Software to Product so that the license can be expanded to non-software product licensing usage (e.g. graphics, video, manufacturing design, audio, etc) without needing to spin multiple outbound licenses; AND
  2. Added license assignment, ratification, and tenure section to specify when and how is the license applied; AND
  3. Added version controlled clauses for which version shall be in effect by default; AND
  4. Added artifical intelligence training dataset usage clauses; AND
  5. Added Sensitive Data warranty and liability coverage; AND
  6. Added global vendors (e.g. datacenter) Sensitive Data limitation of liability; AND
  7. Added force manjure limitation of liability; AND
  8. Added global vendors (e.g. datacenter) Sensitive Data limitation of liability; AND
  9. Added judiciary minimal damage values limitation of liability; AND
  10. Expanded grant clauses into Creative Commons' rights categories; AND
  11. Added geographical indicator coverage; AND
  12. Added protected geographical indicator coverage; AND
  13. Added protected designation indicator coverage; AND
  14. Added industrial design use coverage; AND
  15. Added integrated circuit layout design use coverage; AND
  16. Added trade secret use coverage.

This repository was formally known as (Holloway) Chew, Kean Ho BSD 3 Clauses License but was renamed for consistency purposes.

Version Controlled

This repository is version controlled using semantic versioning definitions where:

  1. the MAJOR version denotes major legal changes; AND
  2. the MINOR version denotes minor changes without altering the legal implication side of things such as but not limited to grammar correction, fonts, typo, and etc; AND
  3. the PATCH version denotes the repository management changes such as but not limited to new language addition, updating README.md, and etc.

License Nature

To use this license for your product licensing, you MUST, in layman terms, consider the following as your recipient perpectives:

  1. You're only allowed to use for personal deployment as long as you:
    1. SHALL AND STRICTLY REQUIRED to attribute to the copyright holders; AND
    2. SHALL accept that the creators are not responsible for anything of any kind; AND
    3. SHALL retain the copyright notices and effects of the product you use, be it in its raw form (e.g. source codes) or its produced form (compiled software binary files); AND
    4. SHALL NOT use the creators' name, brand, and trademark without their written notices for any endorsement of your pursue; AND
    5. are NOT REQUIRED to expose and upstream your changes back to the copyright holders all the way back to us (copyleft effect); AND
    6. SHALL, when applicable, obtain the grant of registered IP (e.g. patent, industrial design, IC layout design, etc) directly from the owner on your own before use; AND
  2. You're only allowed to use for commercial deployment as long as you:
    1. SHALL AND STRICTLY REQUIRED to attribute to the copyright holders; AND
    2. SHALL accept that the creators are not responsible for anything of any kind; AND
    3. SHALL retain the copyright notices and effects of the product you use, be it in its raw form (e.g. source codes) or its produced form (compiled software binary files); AND
    4. SHALL NOT use the creators' name, brand, and trademark without their written notices for any endorsement of your pursue; AND
    5. are NOT REQUIRED to expose and upstream your changes back to the copyright holders all the way back to us (copyleft effect); AND
    6. SHALL, when applicable, obtain the grant of registered IP (e.g. patent, industrial design, IC layout design, etc) directly from the owner on your own before use; AND
  3. You're only allowed to edit/modify as long as you:
    1. SHALL AND STRICTLY REQUIRED to attribute to the copyright holders; AND
    2. SHALL accept that the creators are not responsible for anything of any kind; AND
    3. SHALL retain the copyright notices and effects of the product you use, be it in its raw form (e.g. source codes) or its produced form (compiled software binary files); AND
    4. SHALL NOT use the creators' name, brand, and trademark without their written notices for any endorsement of your pursue; AND
    5. are NOT REQUIRED to expose and upstream your changes back to the copyright holders all the way back to us (copyleft effect); AND
    6. SHALL, when applicable, obtain the grant of registered IP (e.g. patent, industrial design, IC layout design, etc) directly from the owner on your own before use; AND
  4. You're only allowed to remix/remaster as long as you:
    1. SHALL AND STRICTLY REQUIRED to attribute to the copyright holders; AND
    2. SHALL accept that the creators are not responsible for anything of any kind; AND
    3. SHALL retain the copyright notices and effects of the product you use, be it in its raw form (e.g. source codes) or its produced form (compiled software binary files); AND
    4. SHALL NOT use the creators' name, brand, and trademark without their written notices for any endorsement of your pursue; AND
    5. are NOT REQUIRED to expose and upstream your changes back to the copyright holders all the way back to us (copyleft effect); AND
    6. SHALL, when applicable, obtain the grant of registered IP (e.g. patent, industrial design, IC layout design, etc) directly from the owner on your own before use; AND
  5. You're only allowed to distribute as long as you:
    1. SHALL AND STRICTLY REQUIRED to attribute to the copyright holders; AND
    2. SHALL accept that the creators are not responsible for anything of any kind; AND
    3. SHALL retain the copyright notices and effects of the product you use, be it in its raw form (e.g. source codes) or its produced form (compiled software binary files); AND
    4. SHALL NOT use the creators' name, brand, and trademark without their written notices for any endorsement of your pursue; AND
    5. are NOT REQUIRED to expose and upstream your changes back to the copyright holders all the way back to us (copyleft effect); AND
    6. SHALL, when applicable, obtain the grant of registered IP (e.g. patent, industrial design, IC layout design, etc) directly from the owner on your own before use; AND
  6. You're only allowed to re-distribute as long as you:
    1. SHALL AND STRICTLY REQUIRED to attribute to the copyright holders; AND
    2. SHALL accept that the creators are not responsible for anything of any kind; AND
    3. SHALL retain the copyright notices and effects of the product you use, be it in its raw form (e.g. source codes) or its produced form (compiled software binary files); AND
    4. SHALL NOT use the creators' name, brand, and trademark without their written notices for any endorsement of your pursue; AND
    5. are NOT REQUIRED to expose and upstream your changes back to the copyright holders all the way back to us (copyleft effect); AND
    6. SHALL, when applicable, obtain the grant of registered IP (e.g. patent, industrial design, IC layout design, etc) directly from the owner on your own before use; AND
  7. You're only allowed to perform any miscellaneous rights not mentioned above as long as you:
    1. SHALL AND STRICTLY REQUIRED to attribute to the copyright holders; AND
    2. SHALL accept that the creators are not responsible for anything of any kind; AND
    3. SHALL retain the copyright notices and effects of the product you use, be it in its raw form (e.g. source codes) or its produced form (compiled software binary files); AND
    4. SHALL NOT use the creators' name, brand, and trademark without their written notices for any endorsement of your pursue; AND
    5. are NOT REQUIRED to expose and upstream your changes back to the copyright holders all the way back to us (copyleft effect); AND
    6. SHALL, when applicable, obtain the grant of registered IP (e.g. patent, industrial design, IC layout design, etc) directly from the owner on your own before use.

Reference & Download Source

The latest license files shall be referenced and be downloadable from:

https://doi.org/10.5281/zenodo.13777226

License Notice

The following are the license notice within the supported languages:

English

Copyright [YEAR] [FULL_LEGAL_NAME] [CONTACT_LIKE_EMAIL_ADDRESS]


Licensed under the (Holloway) Chew, Kean Ho’s Research & Libre License
(the "License"); you may not use this file except in compliance with
the License. You may obtain a copy of the License at

                 https://doi.org/10.5281/zenodo.13777226

Unless required by applicable law or agreed to in writing, the content
distributed under the License is distributed on an "AS IS" BASIS,
WITHOUT WARRANTIES OR CONDITIONS OF ANY KIND, either express or implied.
The License does not express or implied to license any party’s registered
and confidential intellectual properties such as but not limited to
patent, patent in process, industrial design,
integrated circuit layout design, and trade secrets. See the License for
the specific language governing permissions and limitations under
the License.

License

This workspace and repository is published under Creative Common CC-BY-ND 4.0.